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These are microscopic images of structures fabricated at the NanoSyd laboratory, Mads Clausen Institute,
University of Southern Denmark, by Dr. James Hoyland and his colleagues.

The photolithographic masks used to fabricate these structures were Bluefire® Police™ 35mm film negatives exposed in a conventional 35mm SLR camera and developed in Bluefire Micro high-contrast developer.

These images are copyright and are used with permission. They must not be copied and reproduced without permission from the copyright owner.

L-SU8: electron microscope image of a structures etched onto a silicon wafer using a mask made with Bluefire Police 35mm film.


L-PDMS: electron microscope image of a flexible mold pulled from the etched silicon original (L-SU8, above).


CROSS-SU8: a cross structure etched onto a silicon wafer using a mask made with Bluefire Police 35mm film.


CROSS-PDMS: a flexible mold pulled from the etched silicon original.


CROSS-NEG22: Bluefire Police negative enlarged with an optical microscope to show edge definition and image density.


L-NEG22: Bluefire Police negative, images enlarged with an optical microscope. The smallest lines are about 10 microns wide.